Number | Author | Title | |
| | VUV and EUV instrumentation | |
1 | E.F. Barte | Soft X‐ray generation under the action of pico and nanosecond laser pulses on nano‐structured target | TU Prague |
2 | R. Lokasani | XUV emission from highly ionized plasmas of 2nd transition row elements, irradiated by Q‐switched N | TU Prague |
3 | J. van Veldhoven | Towards a contamination‐tolerant EUV power sensor | TNO |
4 | L. Rodriguez‐de Marcos | VUV reflectometer for in‐situ measurement of coatings | CSIC |
5 | M. Tryus | A spatially resolving non‐destructive tool for multi‐angle EUV spectroscopic reflectometry | RWTH |
6 | J. Bußmann | Coherent diffractive imaging for actinic inspection with EUV light produced by a laboratory‐scale gas discharge radiation source | RWTH |
7 | A. Sokolov | An XUV At‐Wavelength Metrology facility at BESSY‐II | HZB |
8 | F. Nawaz | Capillary discharge based soft X‐ray imaging setup, using Fresnel zone plate (FZP) optics | TU Prague |
9 | D. Wilson | Laboratory‐based photoemission spectro‐microscopy at 71.7 eV for studies of complex materials | FZJ |
| | Optics & Materials | |
10 | P. Pennartz | Recent Developments for X‐ray Optics, from EUV to hard X‐Rays | Rigaku |
11 | O. Hofmann | Investigation of Luminescent Materials for EUV Metrology Applications
| RWTH |
12 | A. Comisso | Optical Properties of TiO2 thin films from soft x‐ray reflectivity measurements | U Padova |
13 | F. Liu | EUV induced secondary electron emission on HfO2, SnO2, and Ru thin films | MESA+ |
14 | A. Zameshin | Free‐form approach to reconstruct periodic multilayer structure from X‐Ray reflectivity | U Twente |
15 | E. Darlatt | Degradation of organic thin films by UV/VIS irradiation investigated by UPS and XPS | PTB |
16 | T. Siefke | VUV wire grid polarizer based on interband absorption
| FSU |
| | Detectors
| |
17 | A. Sorokin | Gas‐monitor detectors for x‐ray FELs | DESY |
18 | V. Zabrodskii | SiPM for direct VUV registration | Ioffe |
19 | V. Zabrodskii | VUV detector based on SiC | Ioffe |
| | Scatter techniques | |
20 | S. Burger | FEM Maxwell solver for EUV and X‐ray scattering applications | JCMwave |
21 | H. Groß | Impact of different LER patterns on scattered light intensities | PTB |